Silicon Dioxide (SiO2) Sputtering Targets Quartz Glass Ring

Silicon Dioxide (SiO2) Sputtering Targets Quartz Glass Ring

Silicon dioxide (SiO2) sputtering targets are used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

Other shapes of silicon dioxide (SiO2) sputtering targets: disc, flat plate, pillar target, step target, customized shape.

Packaging: Silicon dioxide (SiO2) sputtering targets are vacuum sealed.

Available dimension:

φ212*φ170*15mm

φ300*φ230*15mm

φ335*φ265*15mm

Properties of Quartz Glass
1. High temperature resistance. The softening point temperature of quartz glass is about 1730°C, it can be used for a long time at 1100℃, and the higher temperature can reach 1450℃ in a short time.
2. Corrosion resistance. Except for hydrofluoric acid, quartz glass hardly reacts with other acids. Its acid resistance is 30 times that of ceramics and 150 times that of stainless steel. Especially the chemical stability at high temperature is unmatched by any other engineering material.
3. Good light transmission performance. Quartz glass has good transmittance in the entire spectrum from ultraviolet to infrared, and the transmittance of visible light is above 93%, especially in the ultraviolet spectrum, the maximum transmittance can reach more than 80.
4. Good thermal stability. Quartz glass has a small thermal expansion coefficient and can withstand severe temperature changes. When the quartz glass is heated to about 1100 ℃, it will not burst when placed in normal temperature water.
5. Quartz glass has good electrical insulation properties. The resistance value of quartz glass is equivalent to 10,000 times that of ordinary glass. It is an excellent electrical insulating material with good electrical properties even at room temperature.